Review on Metallization Approaches for High-Efficiency Silicon Heterojunction Solar Cells

Abstract Crystalline silicon (c-Si) heterojunction (HJT) solar cells are one of the promising technologies for next-generation industrial high-efficiency cells, and many efforts in transferring this technology to high-volume manufacturing photovoltaic (PV) industry currently ongoing. Metallization is vital importance PV performance long-term reliability HJT cells. In review, we summarize development status metallization approaches For conventional screen printing technology, avoid degradation passivation properties amorphous layer, a low-temperature-cured (< 250 ℃) paste process needed. This process, turn, leads high line/contact resistances costs. To improve conductivity electrodes reduce cost, multi-busbar, fine-line printing, silver-coated copper pastes have been developed. addition, several potential such as Smart Wire Contacting Technology, pattern transfer inkjet/FlexTrailprinting, electroplating, discussed detail. Based on summary, challenges these analyzed.